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(Chicago.CityRegions.Com, December 06, 2016 ) According to a new market research report on the "Chemical Mechanical Planarization Market by type (Equipment & consumables), Application(IC manufacturing, MEMS & NEM, Optics and Others), Technology (Leading edge, More Than Moore’s, and Emerging), and Geography (North America, Europe, APAC and RoW) - Global Forecast to 2020", the market is expected to grow at a CAGR of 6.83% between 2015 and 2020, and reach $4.94 Billion by 2020.
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The chemical mechanical planarization is a critical process technology step in the semiconductor wafer fabrication process. In this process step, the top surface of the wafer is polished or planarized to create a flawless flat surface that is essential to make faster and more powerful semiconductor devices with the aid of chemical slurry & mechanical movements. The CMP tool is comprised a rotating platen, slurry, pad, holding ring, brush, and pad conditioner. The mechanical element of this system applies downward pressure to a wafer surface, while the chemical reaction increases the material removal rate. The value chain of the CMP market consists of different players, including semiconductor material suppliers, CMP integrated solution providers, semiconductor wafer suppliers, semiconductor device manufacturers, slurry & pad manufacturers, technology solution providers, and CMP equipment manufacturers.
The global CMP market was worth USD 3.32 Billion in 2014, and it is expected to reach USD 4.94 Billion by 2020, at an estimated CAGR of 6.83% from 2015 to 2020. Though the CMP market is at the mature stage, it still continues to evolve depending on the end users. The industry is being forced to adopt much innovation in process technologies and applications; as a result, different CMP processes have been evolved with technology nodes and newer applications such as MEMS, advanced packaging, and advanced substrates. The growing demand for consumer electronic products, increasing need of wafer planarization, and increasing use of micro-electro-mechanical systems (MEMS) is driving the global CMP market.
The CMP equipment market is expected to grow at the highest CAGR of 8.32% from 2015 to 2020. The key factors behind the high growth of the CMP equipment market is the strong growth in semiconductor equipment and capital spending. The CMP consumables market was valued at USD 2.25 Billion in 2014 and is expected to reach to USD 3.21 billion by 2020. The Applied Materials, Inc. (U.S.) & Ebara Corporation (Japan) are the major CMP equipment suppliers for different integrated device manufacturers.
This CMP consumables market is dominated by major market players such as Cabot Microelectronics Corporation (U.S.), Fujimi Incorporated (Japan), and Dow Electronic Materials (U.S.).The CMP regional market is mainly dominated by Asia-Pacific, followed by North America and Europe. The Asia-Pacific region accounted for the largest market share of ~67% and is expected to grow at the highest CAGR of 7.40% during the forecast period, followed by North America. The countries in Asia-Pacific region such as Taiwan, South Korea, Japan, and China are investing more in semiconductor manufacturing to meet the increasing demand for consumer electronic products. This detailed market research study provides detailed qualitative and quantitative analysis of the global chemical mechanical planarization market. It provides a comprehensive review of major market drivers, restraints, opportunities,, challenges, and key issues in the market. Competitive scenario and market share of the top players have been discussed in detail. The top players of the industry are profiled in detail with their recent developments and other strategic industry activities.
Some of the major companies profiled in the report are Applied Materials, Inc. (U.S.), Ebara Corporation (Japan), Cabot Microelectronics Corporation (U.S.), Dow Electronic Materials (U.S.), and Fujimi Incorporated (Japan).
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